Name: 8/6/4/2Inch LPCVD Oksidasi Tungku Otomatisasi penuh Kontrol Oksigen Rendah Deposisi film tipis
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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8/6/4/2Inch LPCVD Oksidasi Tungku Otomatisasi penuh Kontrol Oksigen Rendah Deposisi film tipis

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April 27, 2025

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Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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